Recently, a Nanoscribe Quantum X system was installed at the Chair of Materials Physics.
This additive manufacturing tool is the world’s first Two-Photon Grayscale Lithography (2GL®) system, enabling the direct fabrication of complex microstructures with nanometer resolution, through multi photon polymerization. Whether for micro-mechanics, micro-optics, photonics, or biomedical devices, this method delivers ultra-smooth surfaces, freeform geometries, and production-ready throughput with lateral resolution below 200 nm and vertical resolution of 100 nm at a maximum working area of 50 × 50 mm2. Ready-to-print resin materials range from biocompatible and highly compliant (silicone-like) to hard and stiff (acrylate-like) polymers, offering a range of refractive indices for tailored optical properties, with the additional possibility to use self-formulated polymer solutions.
State-of-the-art multiphoton lithography system
